Other “technology” as follows. a. Optical fabrication technologies for serially producing optical components at a rate exceeding 10 m2 of surface area per year on any single spindle and having all of the following: a.1. Area exceeding 1 m2, and a.2. Surface figure exceeding λ/10 (rms) at the designed wavelength; b. “Technology” for optical filters with a bandwidth equal to or less than 10 nm, a field of view (FOV) exceeding 40° and a resolution exceeding 0.75 line pairs per milliradian; c. “Technology” for the “development” or “production” of cameras controlled by 6A993; d. “Technology” “required” for the “development” or “production” of non‑triaxial fluxgate “magnetometers” or non‑triaxial fluxgate “magnetometer” systems, having any of the following: d.1. ‘Sensitivity’ lower (better) than 0.05 nT (rms) per square root Hz at frequencies of less than 1 Hz; or d.2. ‘Sensitivity’ lower (better) than 1 x 10‑3 nT (rms) per square root Hz at frequencies of 1 Hz or more; e. “Technology” “required” for the “development” or “production” of infrared up-conversion devices having all of the following: e.1. A response in the wavelength range exceeding 700 nm but not exceeding 1500 nm; and e.2. A combination of an infrared photodetector, light emitting diode (LED), and nanocrystal to convert infrared light into visible light. Technical Note: For the purposes of entry 6E993, ‘sensitivity’ (or noise level) is the root mean square of the device ‑limited noise floor which is the lowest signal that can be measured.