Last Updated: April 11, 2026
Last Updated: April 11, 2026
Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits
Code
3920 10 23
EU Code
X.C.I.001
Category
ANNEX VII - List of goods and technology referred to in Articles 2a(1) and 2b(1)
Subcategory
Electronics
Prohibited Supply To
RUAuthority
EU
Document
EU Regulation 833/2014
Note
Positive resists designed for semiconductor lithography specially adjusted (optimised) for use at wavelengths between 370 and 193 nm.
Program information
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