Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Code

3920 10 23

EU Code

X.C.I.001

Category

ANNEX Va - List of goods and technology referred to in Articles 1f(1) and 1fa(1)

Subcategory

Electronics

Prohibited Supply To

Belarus

Authority

EU

Document

EU Regulation 765/2006

Note

Positive resists designed for semiconductor lithography specially adjusted (optimised) for use at wavelengths between 370 and 193 nm.

Goods